Effective control of the arc discharge-generated plasma jet by smartly designed magnetic fields

Baranov, O; Fang, J; Keidar, M; Lu, X; Cvelbar, U; Ostrikov, KK

Effective control of the arc discharge-generated plasma jet by smartly designed magnetic fields

Baranov, O Fang, J

Keidar, M Lu, X Cvelbar, U Ostrikov, KK

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Publication Type:: Journal Article
Citation:: IEEE Transactions on Plasma Science, 2014, 42 (10), pp. 2464 - 2465
Issue Date:: 2014-10-01

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Field	Value	Language
dc.contributor.author	Baranov, O	en_US
dc.contributor.author	Fang, J https://orcid.org/0000-0002-2214-2902	en_US
dc.contributor.author	Keidar, M	en_US
dc.contributor.author	Lu, X	en_US
dc.contributor.author	Cvelbar, U	en_US
dc.contributor.author	Ostrikov, KK	en_US
dc.date.issued	2014-10-01	en_US
dc.identifier.citation	IEEE Transactions on Plasma Science, 2014, 42 (10), pp. 2464 - 2465	en_US
dc.identifier.issn	0093-3813	en_US
dc.identifier.uri	http://hdl.handle.net/10453/116097
dc.description.abstract	© 2014 IEEE. Control of ion current directed to a substrate is a key feature of plasma processing reactors. Magnetic field has been used to enhance the plasma setups. Two magnetic coils placed under the substrate together with the coils near the plasma source, generate magnetic traps for the plasma electrons in a vacuum chamber, to confine them and generate electric field to influence the ion motion. Images of the plasma jet patterns for different configurations of the magnetic field are presented.	en_US
dc.relation.ispartof	IEEE Transactions on Plasma Science	en_US
dc.relation.isbasedon	10.1109/TPS.2014.2323263	en_US
dc.subject.classification	Fluids & Plasmas	en_US
dc.title	Effective control of the arc discharge-generated plasma jet by smartly designed magnetic fields	en_US
dc.type	Journal Article
utslib.citation.volume	10	en_US
utslib.citation.volume	42	en_US
utslib.for	0202 Atomic, Molecular, Nuclear, Particle and Plasma Physics	en_US
utslib.for	0906 Electrical and Electronic Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
utslib.copyright.status	closed_access
pubs.issue	10	en_US
pubs.publication-status	Published	en_US
pubs.volume	42	en_US

Abstract:

© 2014 IEEE. Control of ion current directed to a substrate is a key feature of plasma processing reactors. Magnetic field has been used to enhance the plasma setups. Two magnetic coils placed under the substrate together with the coils near the plasma source, generate magnetic traps for the plasma electrons in a vacuum chamber, to confine them and generate electric field to influence the ion motion. Images of the plasma jet patterns for different configurations of the magnetic field are presented.

Please use this identifier to cite or link to this item:

http://hdl.handle.net/10453/116097