Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity

Azuma, K; Sun, J; Choo, Y; Rokhlenko, Y; Dwyer, JH; Schweitzer, B; Hayakawa, T; Osuji, CO; Gopalan, P

Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity

Azuma, K Sun, J Choo, Y

Rokhlenko, Y Dwyer, JH Schweitzer, B Hayakawa, T Osuji, CO Gopalan, P

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Publisher:: AMER CHEMICAL SOC
Publication Type:: Journal Article
Citation:: Macromolecules, 2018, 51, (16), pp. 6460-6467
Issue Date:: 2018-08-28

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Field	Value	Language
dc.contributor.author	Azuma, K
dc.contributor.author	Sun, J
dc.contributor.author	Choo, Y https://orcid.org/0000-0003-2715-0618
dc.contributor.author	Rokhlenko, Y
dc.contributor.author	Dwyer, JH
dc.contributor.author	Schweitzer, B
dc.contributor.author	Hayakawa, T
dc.contributor.author	Osuji, CO
dc.contributor.author	Gopalan, P
dc.date.accessioned	2022-09-08T01:20:16Z
dc.date.available	2022-09-08T01:20:16Z
dc.date.issued	2018-08-28
dc.identifier.citation	Macromolecules, 2018, 51, (16), pp. 6460-6467
dc.identifier.issn	0024-9297
dc.identifier.issn	1520-5835
dc.identifier.uri	http://hdl.handle.net/10453/161505
dc.description.abstract	We report the successful synthesis of previously inaccessible poly(3-hydroxystyrene)-block-poly(dimethylsiloxane) (P3HS-b-PDMS) block copolymers (BCPs) with varying volume fractions, molecular weights, and narrow dispersities by sequential living anionic polymerization. The chemical structure and molecular weight were fully characterized by 1H NMR and gel permeation chromatography. The BCP phase behavior was investigated using small-angle X-ray scattering (SAXS) and transmission electron microscopy. Temperature-resolved SAXS measurements from symmetric disordered sample were used to determine the interaction parameter (χ) using mean-field theory. The results provide an estimate for interaction parameter, χHS/DMS(T) = 33.491/T + 0.3126, with an upper bound value of 0.39 at 150 °C. The calculated χ for P3HS-b-PDMS is approximately 4 times higher than that observed in a commonly studied high-χ system, PS-b-PDMS. The ultrahigh interaction parameter observed here affords the formation of well-ordered materials at remarkably low molecular weight. The presence of both PDMS and P3HS provides significant versatility in terms of etch selectivity, while the hydroxystyrene domain offers additional functionality as it can be exploited for immobilizing functional organic moieties.
dc.language	English
dc.publisher	AMER CHEMICAL SOC
dc.relation.ispartof	Macromolecules
dc.relation.isbasedon	10.1021/acs.macromol.8b01409
dc.rights	info:eu-repo/semantics/closedAccess
dc.subject	03 Chemical Sciences, 09 Engineering
dc.subject.classification	Polymers
dc.title	Self-Assembly of an Ultrahigh-χ Block Copolymer with Versatile Etch Selectivity
dc.type	Journal Article
utslib.citation.volume	51
utslib.for	03 Chemical Sciences
utslib.for	09 Engineering
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology
pubs.organisational-group	/University of Technology Sydney/Faculty of Engineering and Information Technology/School of Civil and Environmental Engineering
utslib.copyright.status	closed_access	*
dc.date.updated	2022-09-08T01:20:14Z
pubs.issue	16
pubs.publication-status	Published
pubs.volume	51
utslib.citation.issue	16

Abstract:

We report the successful synthesis of previously inaccessible poly(3-hydroxystyrene)-block-poly(dimethylsiloxane) (P3HS-b-PDMS) block copolymers (BCPs) with varying volume fractions, molecular weights, and narrow dispersities by sequential living anionic polymerization. The chemical structure and molecular weight were fully characterized by 1H NMR and gel permeation chromatography. The BCP phase behavior was investigated using small-angle X-ray scattering (SAXS) and transmission electron microscopy. Temperature-resolved SAXS measurements from symmetric disordered sample were used to determine the interaction parameter (χ) using mean-field theory. The results provide an estimate for interaction parameter, χHS/DMS(T) = 33.491/T + 0.3126, with an upper bound value of 0.39 at 150 °C. The calculated χ for P3HS-b-PDMS is approximately 4 times higher than that observed in a commonly studied high-χ system, PS-b-PDMS. The ultrahigh interaction parameter observed here affords the formation of well-ordered materials at remarkably low molecular weight. The presence of both PDMS and P3HS provides significant versatility in terms of etch selectivity, while the hydroxystyrene domain offers additional functionality as it can be exploited for immobilizing functional organic moieties.

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http://hdl.handle.net/10453/161505