Role of activated chemisorption in gas-mediated electron beam induced deposition

Bishop, J; Lobo, CJ; Martin, A; Ford, M; Phillips, M; Toth, M

Role of activated chemisorption in gas-mediated electron beam induced deposition

Bishop, J Lobo, CJ

Martin, A

Ford, M

Phillips, M

Toth, M

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Publication Type:: Journal Article
Citation:: Physical Review Letters, 2012, 109 (14)
Issue Date:: 2012-10-03

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Field	Value	Language
dc.contributor.author	Bishop, J	en_US
dc.contributor.author	Lobo, CJ https://orcid.org/0000-0002-2746-1363	en_US
dc.contributor.author	Martin, A https://orcid.org/0000-0003-2362-5524	en_US
dc.contributor.author	Ford, M https://orcid.org/0000-0002-8595-5900	en_US
dc.contributor.author	Phillips, M https://orcid.org/0000-0003-1522-9281	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.date.issued	2012-10-03	en_US
dc.identifier.citation	Physical Review Letters, 2012, 109 (14)	en_US
dc.identifier.issn	0031-9007	en_US
dc.identifier.uri	http://hdl.handle.net/10453/22779
dc.description.abstract	Models of adsorbate dissociation by energetic electrons are generalized to account for activated sticking and chemisorption, and used to simulate the rate kinetics of electron beam induced chemical vapor deposition (EBID). The model predicts a novel temperature dependence caused by thermal transitions from physisorbed to chemisorbed states that govern adsorbate coverage and EBID rates at elevated temperatures. We verify these results by experiments that also show how EBID can be used to deposit high purity materials and characterize the rates and energy barriers that govern adsorption. © 2012 American Physical Society.	en_US
dc.relation.ispartof	Physical Review Letters	en_US
dc.relation.isbasedon	10.1103/PhysRevLett.109.146103	en_US
dc.subject.classification	General Physics	en_US
dc.title	Role of activated chemisorption in gas-mediated electron beam induced deposition	en_US
dc.type	Journal Article
utslib.citation.volume	14	en_US
utslib.citation.volume	109	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	01 Mathematical Sciences	en_US
utslib.for	02 Physical Sciences	en_US
utslib.for	09 Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/DVC (Research)
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - CCET - Centre for Clean Energy Technology
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	closed_access
pubs.issue	14	en_US
pubs.publication-status	Published	en_US
pubs.volume	109	en_US

Abstract:

Models of adsorbate dissociation by energetic electrons are generalized to account for activated sticking and chemisorption, and used to simulate the rate kinetics of electron beam induced chemical vapor deposition (EBID). The model predicts a novel temperature dependence caused by thermal transitions from physisorbed to chemisorbed states that govern adsorbate coverage and EBID rates at elevated temperatures. We verify these results by experiments that also show how EBID can be used to deposit high purity materials and characterize the rates and energy barriers that govern adsorption. © 2012 American Physical Society.

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http://hdl.handle.net/10453/22779