Electron beam induced chemical dry etching and imaging in gaseous NH <inf>3</inf> environments

Lobo, CJ; Martin, A; Phillips, MR; Toth, M

Electron beam induced chemical dry etching and imaging in gaseous NH <inf>3</inf> environments

Lobo, CJ

Martin, A

Phillips, MR

Toth, M

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Publication Type:: Journal Article
Citation:: Nanotechnology, 2012, 23 (37)
Issue Date:: 2012-09-21

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Field	Value	Language
dc.contributor.author	Lobo, CJ https://orcid.org/0000-0002-2746-1363	en_US
dc.contributor.author	Martin, A https://orcid.org/0000-0003-2362-5524	en_US
dc.contributor.author	Phillips, MR https://orcid.org/0000-0003-1522-9281	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.date.issued	2012-09-21	en_US
dc.identifier.citation	Nanotechnology, 2012, 23 (37)	en_US
dc.identifier.issn	0957-4484	en_US
dc.identifier.uri	http://hdl.handle.net/10453/32248
dc.description.abstract	We report the use of ammonia (NH 3) vapor as a new precursor for nanoscale electron beam induced etching (EBIE) of carbon, and an efficient imaging medium for environmental scanning electron microscopy (ESEM). Etching is demonstrated using amorphous carbonaceous nanowires grown by electron beam induced deposition (EBID). It is ascribed to carbon volatilization by hydrogen radicals generated by electron dissociation of NH 3 adsorbates. The volatilization process is also effective at preventing the buildup of residual hydrocarbon impurities that often compromise EBIE, EBID and electron imaging. We also show that ammonia is a more efficient electron imaging medium than H 2O, which up to now has been the most commonly used ESEM imaging gas. © 2012 IOP Publishing Ltd.	en_US
dc.relation.ispartof	Nanotechnology	en_US
dc.relation.isbasedon	10.1088/0957-4484/23/37/375302	en_US
dc.subject.classification	Nanoscience & Nanotechnology	en_US
dc.title	Electron beam induced chemical dry etching and imaging in gaseous NH <inf>3</inf> environments	en_US
dc.type	Journal Article
utslib.citation.volume	37	en_US
utslib.citation.volume	23	en_US
utslib.for	0912 Materials Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - CCET - Centre for Clean Energy Technology
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
utslib.copyright.status	closed_access
pubs.issue	37	en_US
pubs.publication-status	Published	en_US
pubs.volume	23	en_US

Abstract:

We report the use of ammonia (NH 3) vapor as a new precursor for nanoscale electron beam induced etching (EBIE) of carbon, and an efficient imaging medium for environmental scanning electron microscopy (ESEM). Etching is demonstrated using amorphous carbonaceous nanowires grown by electron beam induced deposition (EBID). It is ascribed to carbon volatilization by hydrogen radicals generated by electron dissociation of NH 3 adsorbates. The volatilization process is also effective at preventing the buildup of residual hydrocarbon impurities that often compromise EBIE, EBID and electron imaging. We also show that ammonia is a more efficient electron imaging medium than H 2O, which up to now has been the most commonly used ESEM imaging gas. © 2012 IOP Publishing Ltd.

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http://hdl.handle.net/10453/32248