Dynamic Pattern Formation in Electron-Beam-Induced Etching

Martin, AA; Bahm, A; Bishop, J; Aharonovich, I; Toth, M

Dynamic Pattern Formation in Electron-Beam-Induced Etching

Martin, AA

Bahm, A Bishop, J Aharonovich, I

Toth, M

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Publication Type:: Journal Article
Citation:: Physical Review Letters, 2015, 115 (25)
Issue Date:: 2015-12-15

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Field	Value	Language
dc.contributor.author	Martin, AA https://orcid.org/0000-0003-2362-5524	en_US
dc.contributor.author	Bahm, A	en_US
dc.contributor.author	Bishop, J	en_US
dc.contributor.author	Aharonovich, I https://orcid.org/0000-0003-4304-3935	en_US
dc.contributor.author	Toth, M https://orcid.org/0000-0003-1564-4899	en_US
dc.date.issued	2015-12-15	en_US
dc.identifier.citation	Physical Review Letters, 2015, 115 (25)	en_US
dc.identifier.issn	0031-9007	en_US
dc.identifier.uri	http://hdl.handle.net/10453/41195
dc.description.abstract	© 2015 American Physical Society. We report highly ordered topographic patterns that form on the surface of diamond, span multiple length scales, and have a symmetry controlled by the precursor gas species used in electron-beam-induced etching (EBIE). The pattern formation dynamics reveals an etch rate anisotropy and an electron energy transfer pathway that is overlooked by existing EBIE models. We, therefore, modify established theory such that it explains our results and remains universally applicable to EBIE. The patterns can be exploited in controlled wetting, optical structuring, and other emerging applications that require nano- and microscale surface texturing of a wide band-gap material.	en_US
dc.relation	http://purl.org/au-research/grants/arc/DP140102721
dc.relation	http://purl.org/au-research/grants/arc/DE130100592
dc.relation.ispartof	Physical Review Letters	en_US
dc.relation.isbasedon	10.1103/PhysRevLett.115.255501	en_US
dc.subject.classification	General Physics	en_US
dc.title	Dynamic Pattern Formation in Electron-Beam-Induced Etching	en_US
dc.type	Journal Article
utslib.citation.volume	25	en_US
utslib.citation.volume	115	en_US
utslib.for	0204 Condensed Matter Physics	en_US
utslib.for	0205 Optical Physics	en_US
utslib.for	0912 Materials Engineering	en_US
utslib.for	01 Mathematical Sciences	en_US
utslib.for	02 Physical Sciences	en_US
utslib.for	09 Engineering	en_US
pubs.embargo.period	Not known	en_US
pubs.organisational-group	/University of Technology Sydney
pubs.organisational-group	/University of Technology Sydney/Faculty of Science
pubs.organisational-group	/University of Technology Sydney/Faculty of Science/School of Mathematical and Physical Sciences
pubs.organisational-group	/University of Technology Sydney/Strength - IBMD - Initiative for Biomedical Devices
pubs.organisational-group	/University of Technology Sydney/Strength - MTEE - Research Centre Materials and Technology for Energy Efficiency
pubs.organisational-group	/University of Technology Sydney/Students
utslib.copyright.status	open_access
pubs.issue	25	en_US
pubs.publication-status	Published	en_US
pubs.volume	115	en_US

Abstract:

© 2015 American Physical Society. We report highly ordered topographic patterns that form on the surface of diamond, span multiple length scales, and have a symmetry controlled by the precursor gas species used in electron-beam-induced etching (EBIE). The pattern formation dynamics reveals an etch rate anisotropy and an electron energy transfer pathway that is overlooked by existing EBIE models. We, therefore, modify established theory such that it explains our results and remains universally applicable to EBIE. The patterns can be exploited in controlled wetting, optical structuring, and other emerging applications that require nano- and microscale surface texturing of a wide band-gap material.

Please use this identifier to cite or link to this item:

http://hdl.handle.net/10453/41195